PELCO holey silicon nitride support film, 200nm

Advanced MEMS technologies have been applied to incorporate many improvements into this truly unique next generation Holey Silicon Nitride Support Membrane. Holey membranes or support films are also referred to as perforated or patterned films; there is no film or membrane covering the holes. The platform for this holey silicon nitride support film is the low stress 200nm amorphous silicon nitride support film on a circular 3mm silicon frame with a 0.5 x 0.5mm window. There are twelve hole sizes available ranging from 100nm to 5µm. This design has a number of advantages over previously offered products: Large open areaClosely packed, higher pore density using hexagonal pore patternAdded resilience of membranePractical hole size for experimentsTEM standard circular shape and sizeEasyGrip edge for improved handlingThe PELCO Silicon Nitride Support Films are resistant to solvents, acids and bases, allowing ...

Advanced MEMS technologies have been applied to incorporate many improvements into this truly unique next generation Holey Silicon Nitride Support Membrane. Holey membranes or support films are also referred to as perforated or patterned films; there is no film or membrane covering the holes. The platform for this holey silicon nitride support film is the low stress 200nm amorphous silicon nitride support film on a circular 3mm silicon frame with a 0.5 x 0.5mm window. There are twelve hole sizes available ranging from 100nm to 5µm. This design has a number of advantages over previously offered products: 

  • Large open area
  • Closely packed, higher pore density using hexagonal pore pattern
  • Added resilience of membrane
  • Practical hole size for experiments
  • TEM standard circular shape and size
  • EasyGrip edge for improved handling

The PELCO Silicon Nitride Support Films are resistant to solvents, acids and bases, allowing for dynamic experiments directly on the holey membrane. The Silicon Nitride Support Films allow for high temperature experiments/imaging up to 1000°C. Films can be easily cleaned using glow discharge or plasma cleaning techniques. They also provide a carbon-free background for TEM imaging and analysis. The clean manufacturing techniques avoid the debris particles that are often found on other makes of silicon nitride support films. 

Product Specifications

Defining parameters for the PELCO Holey Silicon Nitride Support Films are: 

  • Membrane Thickness: 200nm for added resilience
  • Window Size: 0.5 x 0.5mm
  • Pore Diameter: Sizes are within 10% of diameter
  • Pattern: Close packed hexagonal arrangement of rows and columns - see table
  • Perforated Area: See table
  • Nominal Porosity: Range between 22.3% to 22.8%
  • Frame Thickness: Silicon support structure is 200um standard. This allows for fitting in standard TEM holders and gives a sturdy support frame
  • Surface Roughness: The RMS (Rq) is 0.65 ±0.06nm which gives a mean roughness (Ra) of 0.45 ±0.02nm
  • Frame Diameter: TEM standard 3mm diameter disc, fully compatible with regular TEM holders and with EasyGrip edges for improved handling
  • Packaging: The PELCO Holey Silicon Nitride Support Films are packaged under cleanroom conditions in the PELCO TEM Grid Storage Box. Each box holds 10 support films.

HOLE SIZE

PORE TYPE

PITCH um

ARRAY

A

B

C

5000nm

circular

10.0um

90 x 90

450µm

450µm

25µm

2500nm

circular

5.0um

45 x 45

450µm

450µm

25µm

1250nm

circular

2.5um

180 x 180

450µm

450µm

25µm

1000nm

circular

2.0um

225 x 225

450µm

450µm

25µm

750nm

circular

1.5um

300 x 300

450µm

450µm

25µm

500nm

circular

1.0um

450 x 450

450µm

450µm

25µm

400nm

circular

0.80um

562 x 562

450µm

450µm

25µm

300nm

circular

0.60um

750 x 750

450µm

450µm

25µm

250nm

circular

0.50um

900 x 900

450µm

450µm

25µm

200nm

circular

0.40um

1125 x 1125

450µm

450µm

25µm

150nm

circular

0.40um

1125 x 1125

450µm

450µm

25µm

100nm

circular

0.20um

375 x 375

75µm

75µm

212.5µm

Code Title Pore Size Pack Size Availability Price Updated: 14-07-2024
PEL21536-10 PELCO holey silicon nitride support film, 200nm 5um Pack/10 No ETA $543.00 AUD
PEL21535-10 PELCO holey silicon nitride support film, 200nm 2.5um Pack/10 No ETA $543.00 AUD
PEL21580-10 PELCO holey silicon nitride support film, 200nm 1250nm Pack/10 No ETA $543.00 AUD
PEL21581-10 PELCO holey silicon nitride support film, 200nm 1000nm Pack/10 No ETA $543.00 AUD
PEL21582-10 PELCO holey silicon nitride support film, 200nm 750nm Pack/10 No ETA $543.00 AUD
PEL21583-10 PELCO holey silicon nitride support film, 200nm 500nm Pack/10 No ETA $543.00 AUD
PEL21584-10 PELCO holey silicon nitride support film, 200nm 400nm Pack/10 No ETA $543.00 AUD
PEL21588-10 PELCO holey silicon nitride support film, 200nm 300nm Pack/10 No ETA $543.00 AUD
PEL21587-10 PELCO holey silicon nitride support film, 200nm 250nm Pack/10 No ETA $543.00 AUD
PEL21586-10 PELCO holey silicon nitride support film, 200nm 200nm Pack/10 No ETA $543.00 AUD
PEL21590-10 PELCO holey silicon nitride support film, 200nm 150nm Pack/10 No ETA $806.00 AUD
PEL21585-10 PELCO holey silicon nitride support film, 200nm 100nm Pack/10 No ETA $806.00 AUD