AFM substrates, silicon chip specimen supports, square

Specimen support for SEM, SIMS, AFM.They are useful as a smooth, inert background is fo...

AFM substrates, V1 grade mica disc

Highest quality grade V1 mica disc 10mm diameter, 0.21mm thick. Interleaved, in packages of 10...

AFM substrates, V1 grade mica sheets

Highest quality Grade V10.15 to 0.177mm (0.006 - 0.007 in.) thickSheets interleaved

AFM substrates, V2 grade mica sheets

Freshly cleaved muscovite mica surfaces have an outstanding even surface, are opt...

PELCO SEM substrate, quartz disc, polished

The PELCO quartz discs or wafers are made from high quality fused quartz (...

SEM carbon planchets

Carbon (graphite) planchets are ideal substrates for backscattered electron imaging in a SEM. ...

SEM high purity vitreous carbon planchet

Lapped surface on one side for smoothness, also known as glassy carbon or glass-like carbon. F...

SEM highly polished carbon planchets

The highly polished carbon planchets for use in analytical SEM/EDX, X-ray analysis and chemica...

SEM low profile carbon planchet holder, 10-32mm dia., M4 cylinder

Low profile planchet holders with M4 threaded base for vitreous carbon and carbon planchets, i...

SEM low profile carbon planchet holder, 10-32mm dia., pin mount

Low profile planchet holders with pin mount for vitreous carbon and carbon planchets, ideal fo...

SEM silicon wafer substrates, Type P, 111

These silicon wafers can be used either as a substrate for thin film research or to make small...

SEM specimen mounts with mounted carbon discs, pin mount

The SEM specimen mounts with 3.2mm pin stubs come mounted with 1.6mm thick carbon discs in a m...

Ultra-flat silicon wafer, type <100>

Ultra-Flat silicon wafer for demanding substrate studies. Can also be used as substrate for AF...

Ultra-flat SiNx coated silicon wafers, 200nm

The Ultra-Flat SiNx Substrates consist of ultra-flat silicon wafers coated with 200nm of amorp...

Ultra-flat thermal SiO2 wafers, 200nm, type <100>

The Ultra-Flat SiO2 substrates consist of a 200nm thermally grown amorphous SiO2 film on an ul...