Silicon nitride support film, 200nm, 2 windows

PELCO Silicon Nitride Support Films are manufactured using state-of-the-art semiconductor and MEMS manufacturing techniques. The amorphous Silicon Nitride Support Film is grown on a silicon wafer to the desired membrane thickness of 8, 15, 35, 50, 100, or 200nm. The specimen viewing area is created by etching away a window in the silicon substrate, leaving a perfectly smooth, resilient and chemically robust silicon nitride film. 

The frame is manufactured as a 3mm silicon disc with smooth EasyGrip edges for easy manipulation by tweezers and will fit perfectly in standard TEM holders. Standard thickness of the silicon frame is 200µm which will fit most TEM holders. A special version with a 50µm thickness and a 0.25 x 0.25mm window is available for special TEM holders which only accommodate thinner supports. Easy handling capabilities and smoothness of the edges are design advantages over other brands of silicon nitride support films. 

The PELCO Silicon Nitride Support Films are manufactured like grids and are completely free from debris particles. The mechanical and chemical stability allow for cleaning of the Silicon Nitride Support Films with chemicals (solvents, acids and bases), glow discharge and plasma cleaning. It is recommended that ultrasonic cleaning not be used, as it can easily shatter the PELCO Silicon Nitride Support Films.

Size:

• PEL21528-10: 200nm with 2 windows 0.1 x 1.5mm