PELCO silicon nitride support film, 200nm, 1 window

Defining parameters for the PELCO Silicon Nitride Support Films are:

• Film Thickness: Resilient, ultra-low-stress 8, 15, 35 or 50nm giving rise to minimum absorption to enable clear imaging; robust, low stress 200nm for better handling and use on multiple platforms;
• Window Sizes: 0.25 x 0.25mm, 0.5 x 0.5mm, 0.75 x 0.75mm, 1.0 x 1.0mm, 0.5 x 1.5mm and multiple window versions with 9 windows of 0.1 x 0.1mm in a 3 x 3 array or 2 windows of 0.1 x 1.5mm. Larger windows give a greater viewing area and for example, allow for the higher tilt angles required for tomography applications. The versions with the multiple windows allows for mounting multiple samples on separate windows;
• Window/Aperture Size for Ultra-Thin, 8nm Film: Window size is 0.5 x 0.5mm with 25 apertures of 60 x 60µm on a 200nm silicon nitride support mesh. Bar width 35µm, edge 30µm.
• Window/Aperture Size for Resilient 35nm Film: Window size is 0.5 x 0.5mm with 25 apertures of 70 x 70µm on a 200nm support mesh. Bar width 25µm, edge 25µm.
• Frame Thickness: Silicon support structure is 200um standard. This allows for fitting in all standard TEM holders and gives a sturdy support frame. 50um is also available for special TEM holders.
• Surface Roughness: The RMS (Rq) is 0.65 ±0.06nm which gives a mean roughness (Ra) of 0.45 ±0.02nm;
• Frame Diameter: EM standard 3mm diameter disc, fully compatible with TEM holders and with EasyGrip edges for improved handling;
• Packaging: The PELCO Silicon Nitride Support Films are packaged under cleanroom conditions in the PELCO #160 TEM Grid Storage Box. Each box holds 10 support films.
• All of our products have <100> orientation with respect to the surface.

Size:

• 200nm with 0.25 x 0.25mm window